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Lithography Process Control (SPIE Tutorial Texts in Optical Engineering Vol. TT28)

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Lithography Process Control (SPIE Tutorial Texts in Optical Engineering Vol. TT28)

Covers lithography process control at several levels, from fundamental through advanced topics. Self-contained tutorial works both as an introduction to the technology and as a reference for the experienced lithographer. Reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback.

Contents

- Preface
- Introduction to the use of statistical process control in lithography
- Sampling
- Simple and complex processes
- Linewidth control
- Overlay
- Yield
- Process drift and automatic process control
- Metrology
- Control of operations