Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol. TT47)
Product ID: 0819439959
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Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol. TT47)
- Used Book in Good Condition
This tutorial summarizes optical lithography enhancement research and development over the past 20 years. Discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.
Contents
- Foreword
- Preface
- List of symbols
- Introduction
- Optical imaging and resolution
- Modified illumination
- Optical proximity correction
- Alternating phase-shifting mask
- Attenuated phase-shift mask
- Selecting appropriate RETs
- Second-generation RETs
- Concluding remarks
- k1 conversion charts
- Bibliography
- Index
Technical Specifications
Country
USA
Brand
Brand: SPIE Publications
Manufacturer
SPIE Publications
Binding
Paperback
EANs
9780819439956
